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Hydrogen passivation of silicon/silicon oxide interface by atomic layer deposited hafnium oxide and impact of silicon oxide underlayer
Author(s):
Evan Oudot
,
Mickael Gros-Jean
,
Kristell Courouble
,
François Bertin
,
Romain Duru
,
Névine Rochat
,
Christophe Vallée
,
E Oudot
,
M. Gros-Jean
,
K Courouble
,
F. Bertin
,
R Duru
,
N Rochat
,
C Vallee
Publication date:
2018
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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Related collections
EU NanoSafety Cluster Publications: Journal Articles
Author and article information
Journal
DOI::
10.1116/1.4999561
ScienceOpen disciplines:
Nanomaterials
,
Materials science
Data availability:
ScienceOpen disciplines:
Nanomaterials
,
Materials science
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