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      SILC decay in Ge-based MOS devices with La<inf>2</inf>O<inf>3</inf> gate dielectrics subjected to constant voltage stress

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      , , , , ,
      IEEE
      2009 Proceedings of the European Solid State Device Research Conference (ESSDERC)
      October 14, 2009 - October 18, 2009

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          Conference
          IEEE
          September 2009
          September 2009
          : 253-256
          Article
          10.1109/ESSDERC.2009.5331319
          f9e663bd-9626-490b-a6c9-0b39e848b4f9
          © 2009
          2009 Proceedings of the European Solid State Device Research Conference (ESSDERC)
          Athens, Greece
          October 14, 2009 - October 18, 2009
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