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      Printed Electronics Based on Inorganic Semiconductors: From Processes and Materials to Devices

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          Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors.

          Transparent electronic devices formed on flexible substrates are expected to meet emerging technological demands where silicon-based electronics cannot provide a solution. Examples of active flexible applications include paper displays and wearable computers. So far, mainly flexible devices based on hydrogenated amorphous silicon (a-Si:H) and organic semiconductors have been investigated. However, the performance of these devices has been insufficient for use as transistors in practical computers and current-driven organic light-emitting diode displays. Fabricating high-performance devices is challenging, owing to a trade-off between processing temperature and device performance. Here, we propose to solve this problem by using a novel semiconducting material--namely, a transparent amorphous oxide semiconductor from the In-Ga-Zn-O system (a-IGZO)--for the active channel in transparent thin-film transistors (TTFTs). The a-IGZO is deposited on polyethylene terephthalate at room temperature and exhibits Hall effect mobilities exceeding 10 cm2 V(-1) s(-1), which is an order of magnitude larger than for hydrogenated amorphous silicon. TTFTs fabricated on polyethylene terephthalate sheets exhibit saturation mobilities of 6-9 cm2 V(-1) s(-1), and device characteristics are stable during repetitive bending of the TTFT sheet.
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            High-κ gate dielectrics: Current status and materials properties considerations

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              2D transition metal dichalcogenides

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                Author and article information

                Journal
                Advanced Materials
                Adv. Mater.
                Wiley
                09359648
                October 2018
                October 2018
                June 27 2018
                : 30
                : 40
                : 1707600
                Affiliations
                [1 ]Institute of Nanotechnology; Karlsruhe Institute of Technology (KIT); D-76344 Eggenstein-Leopoldshafen Germany
                [2 ]Department of Materials Engineering; Indian Institute of Science; Bangalore 560012 India
                [3 ]KIT-TUD Joint Research Laboratory Nanomaterials; Technische Universität Darmstadt (TUD); Institute of Materials Science; Jovanka-Bontschits-Str. 2 ,64287 Darmstadt Germany
                Article
                10.1002/adma.201707600
                b9e0ff4d-d5e5-44cc-a5ff-14020ef2e7b6
                © 2018

                http://doi.wiley.com/10.1002/tdm_license_1.1

                http://onlinelibrary.wiley.com/termsAndConditions#vor

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