- Record: found
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Amorphous lanthanum lutetium oxide thin films as an alternative high-κ gate dielectric
J. M. J. Lopes ,
M. Roeckerath ,
T. Heeg ,
E. Rije ,
J. Schubert ,
S. Mantl ,
V. V. Afanas’ev ,
S. Shamuilia ,
A. Stesmans ,
Y. Jia ,
D. G. Schlom
November 27 2006
November 27 2006
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High-κ gate dielectrics: Current status and materials properties considerations
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Interface Barrier Energy Determination from Voltage Dependence of Photoinjected Currents
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A Thermodynamic Approach to Selecting Alternative Gate Dielectrics
Darrell Schlom, Jeffrey H. Haeni (2002)