High Temperature microhardness of hard coatings produced by physical and chemical vapor deposition

Jindal, Prem C.; Quinto, Dennis T.; Wolfe, George J.

doi:10.1016/0040-6090(87)90166-0

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High Temperature microhardness of hard coatings produced by physical and chemical vapor deposition

Author(s): Dennis T. Quinto , George J. Wolfe , Prem C. Jindal

Publication date Created: October 1987

Publication date (Print): October 1987

Journal: Thin Solid Films

Publisher: Elsevier BV

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Most cited references 12

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Titanium aluminum nitride films: A new alternative to TiN coatings

Wolf‐Dieter Münz (1986)

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Structure and properties of TiN coatings

J.‐E. Sundgren (1985)

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On structure and properties of sputtered Ti and Al based hard compound films

T. Leyendecker, O. Knotek, M. Böhmer (1986)

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Author and article information

Journal

Title: Thin Solid Films

Abbreviated Title: Thin Solid Films

Publisher: Elsevier BV

ISSN (Print): 00406090

Publication date Created: October 1987

Publication date (Print): October 1987

Volume: 153

Issue: 1-3

Pages: 19-36

Article

DOI: 10.1016/0040-6090(87)90166-0

SO-VID: 75d07384-3f7e-4266-a387-8eb7933a54b7

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http://www.elsevier.com/tdm/userlicense/1.0/

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