A new analytical model for the response curve in megavoltage photon beams of the radiochromic EBT3 films measured with flatbed scanners

Abstract

Purpose

The aim of this work is to study a new analytical model which describes the dose–response curve in megavoltage photon beams of the radiochromic EBT3 film measured with two commercially available flatbed scanners. This model takes into account the different increase of the number of two types of absorbents in the film with absorbed dose and it allows to identify parameters that depend on the flatbed scanner and the film model, and parameters that exclusively depend on the production lot. In addition, the new model is also compared with other models commonly used in the literature in terms of its performance in reducing systematic calibration uncertainties.

Methods and materials

The new analytical model consists on a linear combination of two saturating exponential functions for every color channel. The exponents modeling the growing of each kind of absorbent are film model and scanner model‐dependent, but they do not depend on the manufacturing lot. The proposed model considers the different dose kinetics of each absorbent and the apparent effective behavior of one of the absorbents in the red color channel of the scanner.

The dose–response curve has been measured using EBT3 films, a percentage depth dose (PDD) calibration method in a dose range between 0.5 and 25 Gy, and two flatbed scanners: a Microtek 1000 XL and an EPSON 11000 XL. The PDD calibration method allows to obtain a dense collection of calibration points which have been fitted to the proposed response curve model and to other published models. The fit residuals were used to evaluate the performance of each model compared with the new analytical model.

Results

The model presented here does not introduce any systematic deviations up to the degree of accuracy reached in this work. The residual distribution is normally shaped and with lower variance than the distributions of the other published models. The model separates the parameters reflecting specific characteristics of the dosimetry system from the linear parameters which depend only on the production lot and are related to the relative abundance of each type of absorbent. The calibration uncertainty is reduced by a mean factor of two by using this model compared with the other studied models.

Conclusions

The proposed model reduces the calibration uncertainty related to systematic deviations introduced by the response curve. In addition, it separates parameters depending on the flatbed scanner and the film model from those depending on the production lot exclusively and therefore provides a better characterization of the dosimetry system and increases its reliability.